27 مهر 1398
ولي دلوجي

ولی دلوجی

مرتبه علمی: دانشیار
نشانی:
تحصیلات: دکترای تخصصی / فیزیک حالت جامد
تلفن: 0813339841
دانشکده: علوم پایه

مشخصات پژوهش

عنوان
Effect of Nickel Distributions Embedded in Amorphous Carbon Films on Transport Properties
نوع پژوهش مقاله چاپ شده
کلیدواژه‌ها
C-Ni films, Ni concentration, Transport Properties
سال
2018
مجله CHINESE PHYSICS LETTERS
پژوهشگران ولی دلوجی

چکیده

Electrical properties of C/Ni films are studied using four mosaic targets made of pure graphite and stripes of nickel with the surface areas of 1.78, 3.21, 3.92 and 4.64%. The conductivity data in the temperature range of 400–500K shows the extended state conduction. The conductivity data in the temperature range of 150–300K shows the multi-phonon hopping conduction. The Berthelot-type conduction dominates in the temperature range of 50–150 K. The conductivity of the films in the temperature range about 𝑇 < 50K is described in terms of variable-range hopping conduction. In low temperatures, the localized density of state around Fermi level 𝑁(𝐸F) for the film deposition with 3.92% nickel has a maximum value of about 56.2×1017 cm−3eV−1 with the minimum average hopping distance of about 3.43 × 10−6 cm.