1404/04/22
ولی دلوجی

ولی دلوجی

مرتبه علمی: دانشیار
ارکید:
تحصیلات: دکترای تخصصی
اسکاپوس:
دانشکده: دانشکده علوم پایه
نشانی:
تلفن: 0813339841

مشخصات پژوهش

عنوان
تأثیر ضخامت های مختلف نانولایه نیکل روی تک پارامترهای مدل اسیلاتور، شکاف باند نوری و بی نظمی انرژی در CNT های سنتز شده توسط کاتالیزور Cu-Ni @ a-CH
نوع پژوهش
JournalPaper
کلیدواژه‌ها
Ni thickness, optical absorption coefficients, optical absorption edge, optical band gap, optical dispersion parameters
سال
2021
مجله Surfaces and Interfaces
شناسه DOI
پژوهشگران Vali Dalooji

چکیده

In this paper, Cu-Ni NPs @ a-C:H thin films with different Ni layers thickness by co-deposition of RF-sputtering and RF-plasma enhanced chemical vapor deposition (RF-PECVD) were prepared using acetylene gas and Ni and Cu targets. The absorption edge and the optical dispersion parameters in CNTs synthesized by Cu-Ni @ a-C:H catalyst were studied. RBS measurements were performed, which confirmed the presence of Ni and Cu atoms in these films. Using Atomic Force Microscopy (AFM) system, the morphology of the films surface was investigated. The average diameter of the grown CNTs on Ni-Cu NPs @ a-C:H substrates were increased by increasing of Ni layers thickness. The values of dT/dλ and dR/dλ for grown CNTs without Ni show that the minimum value of the optical band gap corresponds to values of 2.55 and 2.56 eV, respectively. The absorption spectra peaks of films are about 400-600 nm. These peaks are quite sharp for carriers band to band transitions and with increasing Ni layers thickness, there is a small shift. It can be seen that the dispersion energy Ed and the oscillator strength f of CNTs synthesized by Cu-Ni @ a-C:H catalyst had the lowest values of 2.21 eV and 9.39 eV2 , respectively, compared to the other films.