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Vali Dalooji

Vali Dalooji

Academic rank: Associate Professor
ORCID:
Education: PhD.
ScopusId:
HIndex:
Faculty: science
Address:
Phone: 0813339841

Research

Title
رابطه بین آهنگ پرش حاملها و ثابتهای ساختاری در لایه های آمورف کربن نیکل با توزیع های مختلف نیکل
Type
JournalPaper
Keywords
Carriers hopping rate ،Carriers efective mass ، Electrical resistivity ، Optical band gap، Optical loss ،Fractal dimensions
Year
2019
Journal OPTICAL AND QUANTUM ELECTRONICS
DOI
Researchers Vali Dalooji

Abstract

In this paper, the flms were prepared by radio frequency magnetron co-sputtering technique. The efect of diferent mosaic targets made of nickel strips and graphite pure on the dielectric relaxation time, the carriers hopping rate, the fractal dimensions and the optical loss of flms were studied. The values of the optical band gap of flms using the cross-point between the tangent of the plot of lower and higher values of the photon energy were calculated. The flms deposited at 4.64% have maximum hopping rate of about 8.6×1012 S−1. It can be seen that the flms deposited at 3.92% have minimum value of fractal dimension of 2.27. With increasing Ni content of flms a nonmetal–metal transition is observed which it is explainable by the power law of percolation theory. Critical metal content and the critical exponent of flms were 87.25% and 1, respectively. With increasing Ni content, the carriers efective mass of flms decreased and average lattice separation values of flms increased. Films deposited at 3.92% have minimum value of Debye frequency νD of about 1.09×1012 Hz. The value of energy loss by free charge carriers when traversing the bulk and surface of flms at 3.92% has maximum value and it has an increasing function behavior with energy