In this paper, the CuAlZnO films were deposited by rf-magnetron sputtering in room temperature on glass substrates. In this deposition process, the equilibrium amount of room temperature during deposition of the CuAlZnO films was provided by the flow of cold water at room temperature inside the copper tubes inserted behind the substrate holder. Then they were annealed by an electric furnace in the presence of argon gas for 1 h at different temperatures of 400, 500, and 600 ◦ C. Micro texture studies of these the CuAlZnO films using the SPIP™ 6.7.4 software, according to ISO 25178–2:2012, in room temperature and using AFM obtained data, were measured. We found that with increasing annealing temperature from 400 to 600 ◦ C, the uniformity and their mean height of the distribution of scattered nanoparticles on the surface of the CuAlZnO films, on films surface were increased. It can be seen that the CAZnO films annealed at 400 ◦ C became more irregular surface hence the maximum value of Sq belongs to these films were in about of 0.09674 mm. The core roughness height Sk calculated as a difference between two extreme levels (maximal and minimal) of surface core, for CAZnO films annealed at 500 ◦ C have maximum value of 0.001537 mm. It can be seen that as deposited CAZnO films have maximum number of high peaks or valleys on their surface. Due to the high polarization of space charges in the top frequency region, the value of log (dielectric loss tan(δ)) in CAZnO films annealed at 500 ◦ C have maximum value. It was found that CAZO films annealed at 500 ◦ C have minimum value of surface kurtosis in about of 8.606 mm. In high frequencies, the AC conductivity of CAZnO films annealed at 400 ◦C has maximum values
