2024 : 12 : 19
Vali Dalooji

Vali Dalooji

Academic rank: Associate Professor
ORCID:
Education: PhD.
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HIndex:
Faculty: science
Address:
Phone: 0813339841

Research

Title
Cu+X @ amorphous carbon hydrogenic films (X = 0, 5, 10 and 15 nm Ni layer): The photons cut-off energy, the optical linear equations and the electron phonon interactions
Type
JournalPaper
Keywords
The copper nickel carbon hydrogenated thin films (the CuNiCH films) Absorption edge broadening intensity Photon penetration intensity Opto-mathematical equations
Year
2024
Journal Optical materials
DOI
Researchers Vali Dalooji

Abstract

The using RF-magnetron sputtering, the Cu + X @ amorphous carbon hydrogenic films (X = 0, 5, 10 and 15 nm Ni layer) thin films that is; CuNiCH films, were deposited on glass substrates at room temperature. Considering that the sputtering process in the films accumulation stage is a completely random process, the configuration and number and diversity of the atoms and ions forming the films were also somewhat affected by this process. Therefor with consideration Nc = 4, Za = 2, Ne = 8, it can be seen that maximum value of coordination number β in these CuNiCH films to be was about 0.279. We found that CuCH films/or CuNiCH films with zero Ni layer, had maximum value of the penetration depths/or the skin depths in about of 380 nm. It can be seen that with increasing Ni layer thickness of films, the absorption edge in these films have a shifting behavior towards lower wavelength (blue-shift). The total range shifting of the absorption edge in these films was as a blue-shift from 2.05 to 2.015 eV. The CuNiCH films with 5 nm Ni have maximum value of optical density. Different linear fitting of ln (⍺) for films were obtained as y = Ax + B where 0.5