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Vali Dalooji

Vali Dalooji

Academic rank: Associate Professor
ORCID:
Education: PhD.
ScopusId:
HIndex:
Faculty: science
Address:
Phone: 0813339841

Research

Title
FERROMAGNETISM IN SEMICONDUCTOR C–Ni FILMS AT DIFFERENT ANNEALING TEMPERATURE
Type
JournalPaper
Keywords
Carbon–nickel ¯lms; annealing temperature; nickel concentration; the coercive ¯eld; the electrical resistivity
Year
2016
Journal SURFACE REVIEW AND LETTERS
DOI
Researchers Vali Dalooji

Abstract

In this work, the microstructure and magnetic properties of carbon–nickel (C–Ni) composite ¯lms annealed at di®erent temperatures (300–1000C) were investigated. The ¯lms were grown by radio frequency magnetron sputtering on quartz substrates at room temperature. The nickel concentration in the ¯lms are a®ected by changing of the value of evaporation nickel atoms and measured by Rutherford backscattering spectroscopy (RBS). Values of coercive ¯eld were measured under both increasing and decreasing applied magnetic ¯eld. It is shown that the coercive ¯eld of ¯lms strongly dependent on the annealing temperature and at 500C ¯lms has maximum value of 93.67 Oe. The di®erence in the coercive ¯elds increased for ¯lms annealed from 300 to 500C and then decreased from 500 to 1000C. The ID/IG ratio of Raman spectra would indicate the presence of higher sp2 bonded carbon in the ¯lms annealed at 800C.