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Vali Dalooji

Vali Dalooji

Academic rank: Associate Professor
ORCID:
Education: PhD.
ScopusId:
HIndex:
Faculty: science
Address:
Phone: 0813339841

Research

Title
Effect of Nickel Distributions Embedded in Amorphous Carbon Films on Transport Properties
Type
JournalPaper
Keywords
C-Ni films, Ni concentration, Transport Properties
Year
2018
Journal CHINESE PHYSICS LETTERS
DOI
Researchers Vali Dalooji

Abstract

Electrical properties of C/Ni films are studied using four mosaic targets made of pure graphite and stripes of nickel with the surface areas of 1.78, 3.21, 3.92 and 4.64%. The conductivity data in the temperature range of 400–500K shows the extended state conduction. The conductivity data in the temperature range of 150–300K shows the multi-phonon hopping conduction. The Berthelot-type conduction dominates in the temperature range of 50–150 K. The conductivity of the films in the temperature range about 𝑇 < 50K is described in terms of variable-range hopping conduction. In low temperatures, the localized density of state around Fermi level 𝑁(𝐸F) for the film deposition with 3.92% nickel has a maximum value of about 56.2×1017 cm−3eV−1 with the minimum average hopping distance of about 3.43 × 10−6 cm.